{"id":290902,"date":"2024-10-19T19:44:46","date_gmt":"2024-10-19T19:44:46","guid":{"rendered":"https:\/\/pdfstandards.shop\/product\/uncategorized\/bs-iso-171092015\/"},"modified":"2024-10-25T16:45:42","modified_gmt":"2024-10-25T16:45:42","slug":"bs-iso-171092015","status":"publish","type":"product","link":"https:\/\/pdfstandards.shop\/product\/publishers\/bsi\/bs-iso-171092015\/","title":{"rendered":"BS ISO 17109:2015"},"content":{"rendered":"
PDF Pages<\/th>\n | PDF Title<\/th>\n<\/tr>\n | ||||||
---|---|---|---|---|---|---|---|
6<\/td>\n | Foreword <\/td>\n<\/tr>\n | ||||||
7<\/td>\n | Introduction <\/td>\n<\/tr>\n | ||||||
9<\/td>\n | 1\tScope 2\tNormative references 3\tTerms and definitions 4\tRequirement of single- and multi-layer reference thin films <\/td>\n<\/tr>\n | ||||||
10<\/td>\n | 5\tDetermination of sputtering rate <\/td>\n<\/tr>\n | ||||||
14<\/td>\n | Annex\u00a0A (informative) Report of international Round Robin Test <\/td>\n<\/tr>\n | ||||||
23<\/td>\n | Annex\u00a0B (informative) Prediction of the rates for a wide range of other materials through tabulated values of sputtering yields <\/td>\n<\/tr>\n | ||||||
24<\/td>\n | Bibliography <\/td>\n<\/tr>\n<\/table>\n","protected":false},"excerpt":{"rendered":" Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy. Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films<\/b><\/p>\n |